In semiconductor manufacturing, calibration and metrology are only as reliable as the wafers on which they are performed. For fabs working with compound semiconductors, patterned GaAs reclaim wafers can help achieve accurate measurements, consistent tool matching, and repeatable process control—all without consuming expensive prime material.
Blank GaAs wafers are useful for basic qualification, but they are insufficient for calibrating tools that require measuring features, edges, and interfaces.
Many metrology systems behave differently when exposed to patterned surfaces. Without patterns, tools may appear "in spec" but produce inconsistent results when real device wafers are introduced.
This mismatch between calibration conditions and production reality is a common cause of measurement drift and false alarms.
Patterned GaAs reclaim wafers contain etched features, alignment marks, dielectric stacks, or residual device structures that challenge tools the same way production wafers do. This enables:
Because GaAs has distinct optical and electrical properties compared to silicon, using silicon test wafers for GaAs tools often introduces hidden bias. Patterned GaAs reclaim wafers eliminate that mismatch.
When sourcing GaAs reclaim wafers for calibration, it’s important to specify pattern type, feature scale, surface condition, and reclaim history. Working with a supplier who understands how metrology tools interact with GaAs patterns ensures your calibration wafers actually improve measurement confidence.
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