Float Zone Wafer | The Float Zone Process


February 22, 2019

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One of the products we are proud to offer is float-zone silicon wafers, which are made with fewer impurities and also result in top quality wafers for industrial use. Here are the basics of how the Float-Zone method works.


Float-zone silicone is a highly pure alternative to silicon crystals grown using the Czochralski process. Using this process results in low levels of light impurities like carbon and oxygen. By reducing the impurities in our silicon, we can also produce stronger and higher quality wafer products. The float-zone method was developed in 1962 based on the zone melting principle. The production of the silicon takes place in a vacuum or inert gaseous atmosphere.


The process begins with a polycrystalline rod and a monocrystalline seed crystal suspended facing each other in a vertical position and are rotated. Both are partially melted, also allowing the new silicon crystal to grow. As the molten zone is moved along the polysilicon rod, the molten silicon solidifies into a single Crystal and, simultaneously, the material is purified. Unlike Czochralski-growth, the silicon molten zone is not in contact with any substances except ambient gas, which may only contain doping gas. Therefore, float-zone silicon can easily achieve much higher purity and higher resistivity.

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Float Zone Wafer

Wafer World is the premier producer of fine silicon wafers for use in electronics and other areas. Call today if you have any questions about how our products are made.

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