FZ Wafer | How Are Float Zone Wafers Made?


December 5, 2018

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Wafers are essential to modern day technology. There are several different methods for creating a wafer that takes different uses into question. One of the more popular wafer creation methods is the Float Zone method. Let’s take a look at the Float Zone method and how it is used to make an FZ wafer.

What is a Float Zone Wafer?

A float zone wafer is a wafer that is made through the float zone method. This method is then used to help the silicon crystals grow. Created in 1962, the float zone method is water based. It is popular because it’s the best way to produce silicon crystals.

What are Their Characteristics?

Float zone wafers feature a high purity and a low concentration of oxygen and carbon. They are also highly resistive to water because of the way they are made. They are mostly subjected to an irradiation known as neutral irradiation in order to control variation of resistance factor in a radial direction of the crystal.

What are the Applications?

Float zone wafers can be found in the following products:

  • Detectors
  • Major power devices
  • Manufacturing of solar cells
  • Manufacturing of windows and lenses

Are You Looking for an FZ Wafer?

No matter what the project, we have the wafers for you. We specialize in all different types of wafers, including FZ wafers. It’s the reason why we have been the go-to source for wafers since 1997. Contact us today to learn more about our wafer services and to place an order.

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