By avoiding contact with crucibles, the float zone refining method reduces contamination by avoiding contact with crucibles and produces the highest-quality silicon substrate. This exceptional purity and crystallographic perfection make FZ wafers highly valuable in advanced scientific and technological research.
FZ wafers' high resistivity and low impurity levels make them perfect for researching high-performance semiconductor devices. They can be applied to the development of high-voltage, high-frequency devices such as MOSFETs and IGBTs in power electronics.
They are also essential for radiation-hardened electronics, which are employed in nuclear and space applications.
For experiments that call for extremely pure and consistent materials, FZ wafers are great. They can be used in:
FZ wafers help study the diffusion of dopants like boron or phosphorus in silicon due to their structural integrity and chemical purity. Additionally, they are used to analyze how thermal treatments affect crystal structure and impurity distribution.
Their purity makes FZ wafers suitable for studies at very low temperatures, including superconductivity experiments or low-temperature electron transport studies, where impurity scattering must be negligible.
Known for their low impurity rate, FZ wafers offer an ideal aid to researchers and scientists. Although an FZ wafer is often viewed as expensive, it’s actually cost-efficient in terms of the infrared material being utilized.
If you’re working on a specific field or experiment, we can help you understand how FZ wafers are used in that context. Contact Wafer World today for more information!
