An important part of the silicon wafer processing is photolithography. Photolithography is a process that embeds patterns on a mask to the surface of a silicon wafer to produce printed circuit boards and microprocessors. Here are some photolithography processes:
A photoresist is a liquid polymeric material that is used to coat substrates where patterns will be etched. With a speed of 1000-5000 rpm, substrates spin as the photoresist coating is poured for an even layer. Another alternative is using a dry film photoresist to laminate it onto the substrate to create a surface where photoresist can be etched.
The areas of the substrate which is photoresist-coated will be exposed using an exposure tool. To expose partial areas of resist, a light will shine over a glass plate that is slightly coated in chrome, which contains the desired patterns to be etched. This method creates a chemical development in the photoresist.
The substrate will be immersed in a developer solution which disintegrates the areas where photoresist was captured by the light. What remains after the immersion in the solution is the desired pattern.
The substrate will be subjected under high heat between 100-120 degrees Celsius in order to get rid of the liquids absorbed into it and to crosslink the remaining photoresist. This process boosts the mechanical and chemical strength of the substrate which prepares it for further processing.
Photolithography in silicon wafer processing is important to create circuits for the production of ICs and semiconductors. If you’re looking for quality wafers to etch your circuit patterns onto, you can get them at Wafer World. At Wafer World, our 20 years of experience in the industry gives us an edge compared to other silicon wafer manufacturing companies. You can trust us to deliver uncompromised quality wafers and excellent customer service. Call us today for inquiries or request a quote online!