Float Zone Wafer | Facts About the Float Zone Method


November 7, 2018

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Float-zone silicon is a high purity option to crystals grown by the Czochralski procedure. The concentrations of light impurities, like carbon and also oxygen, are very low. Because float zone silicon is so pure, it a popular choice for wafers. Let’s take a look at some other important facts about the float zone method and the float zone wafer.

Facts About the Float Zone Method

  • The float zone method is based on the zone-melting principle.
  • It was invented in 1962 by Theuerer.
  • Float zone method is used to grow the silicon crystals.
  • The manufacturing then occurs under vacuum or in an inert gaseous environment.
  • The purity of float zone silicon allows it to go through a lighter doping process.
  • Float-zone silicon wafers are generally not greater than one hundred and fifty millimeters.
  • Float-zone silicon crystals are used in power devices.
  • The common application of float zone wafer is on high-efficiency solar products and even chips.
  • Use of float zone to grow silicon is the best way of producing silicon crystals.
  • Because of how it is made, float zone silicon can easily achieve much higher purity and higher resistivity.

Are You in Need of a Float Zone Wafer?

No matter what the project you are working on, we have the wafers for you. Whether it’s a float zone wafer or another type of wafer, we have the supplies you need to be successful. Contact us today to learn more about our wafer products and to place an order.

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